The aim of the course is to provide knowledge about optical systems and the imaging process in such. The course begins by introducing the paraxial formalism for thin and thick lenses. Since no optical system is perfect, a major part of the course treats how much various systems deviate from ideal ones, i.e. their aberrations, both chromatic and monochromatic. To treat aberrations, general ray tracing equations are derived. Based on these, general expressions for all basic types of aberrations are derived, which then are used for assessing both their origin and occurrence in different types of systems. The course then develops methods and strategies for optimizing optical systems for minimal aberrations or how systems can be designed so their images are free of certain types of aberrations. The course also deals with the impact of diffraction on image quality. It includes both laboratory exercises and design and analysis of optical system on a computer by a ray tracing program.
The information below is only for exchange students
Starts
1 November 2024
Ends
19 January 2025
Study location
Umeå
Language
English
Type of studies
Daytime,
50%
Required Knowledge
90 credits including Waves and Optics or equivalent. Proficiency in English and Swedish equivalent to the level required for basic eligibility for higher studies. Requirements for Swedish only apply if the course is held in Swedish.
Selection
Students applying for courses within a double degree exchange agreement, within the departments own agreements will be given first priority. Then will - in turn - candidates within the departments own agreements, faculty agreements, central exchange agreements and other departmental agreements be selected.
Application code
UMU-A5329
Application
This application round is only intended for nominated exchange students. Information about deadlines can be found in the e-mail instruction that nominated students receive.
The application period is closed.
