The aim of the course is to provide knowledge about optical systems and the imaging process in such. The course begins by introducing the paraxial formalism for thin and thick lenses. Since no optical system is perfect, a major part of the course treats how much various systems deviate from ideal ones, i.e. their aberrations, both chromatic and monochromatic. To treat aberrations, general ray tracing equations are derived. Based on these, general expressions for all basic types of aberrations are derived, which then are used for assessing both their origin and occurrence in different types of systems. The course then develops methods and strategies for optimizing optical systems for minimal aberrations or how systems can be designed so their images are free of certain types of aberrations. The course also deals with the impact of diffraction on image quality. It includes both laboratory exercises and design and analysis of optical system on a computer by a ray tracing program.
90 credits including Waves and Optics or equivalent. Proficiency in English and Swedish equivalent to the level required for basic eligibility for higher studies. Requirements for Swedish only apply if the course is held in Swedish.
Academic credits
Applicants in some programs at Umeå University have guaranteed admission to this course. The number of places for a single course may therefore be limited.
Application code
UMU-53008
Application
Application deadline was
15 April 2024.
Please note: This second application round is intended only for EU/EEA/Swiss citizens.
Submit a
late application
at Universityadmissions.se.
As a citizen of a country outside the European Union (EU), the European Economic Area (EEA) or Switzerland, you are required to pay application and tuition fees for studies at Umeå University.
