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Thin Film Deposition technology (Physical Vapor Deposition), 1.5 ECTS

Time Thursday 5 December until Friday 6 December, 2019 at 09:00 - 18:00
Place NanoLab, Department of Physic

Physical Vapor Deposition technology (sputtering, evaporation, etc.), abbreviated as PVD technology, offers interesting applications for products of our everyday life, like coatings on glass, metals, polymers, ceramics etc.

This interesting technology has proven to be able to create enormous supplementary value to many products. Therefore it is in wide use in many fields such as; optical coatings, photovoltaic, semiconductor, photo electrochemical cells, optoelectronic, flat panel displays, data storage, super capacitor, gas sensors and many others. Thin Film Deposition technology can well be regarded as the major key to the creation of devices such as computers, since microelectronic solid-state devices are all based on material structures created by the deposition techniques.

In this course, the following topics will be explained:  Explanation of PVD technology in general, general characteristics, possibilities and limitations of PVD technology, different kind of processes within PVD technology (sputtering, cathodic arc, reactive sputtering, and evaporation).

Course Instructor: Roushdey Salh, the manager of NanoLab, Department of Physics, Umeå University.

Read more and register (latest on the 1st of December) here.

Roushdey Salh
Read about Roushdey Salh