Information for students, faculty and staff regarding COVID-19. (Updated: 1 July 2020)
NanoLab is a classified Class 100 cleanroom located at the Department of Physics.
The Nanolab was established in June 2012, and has since its inception been in continuous development. Today, it comprises a variety of advanced fabrication and characterization setups, including a mask aligner (Karl Süss Mask Aligner MJB3), a nanoimprinter (Obducat NIL 2.5), a thin-film deposition system (PVD75 thermal evaporator), X-ray diffractometer (PANalytical Xpert3 Powder), a contact angle meter, and a spin coater, as well as number of more standard pieces of equipment, such as vacuum ovens, hotplates, optical microscopes, UV-curing boxes, and analytical scales. A short overview on the available equipment are to be found in below:
As NanoLab's environment is extremely clean (10 000 times less airborne particles than in a normal laboratory), it is possible to manufacture and study materials with notably high standard and precision. The facility is currently an invaluable tool for the University´s rapidly expanding research in the fields of microelectronics, optics and photonics, and nanotechnology, but it is also of obvious interest for scientists that are interested in, e.g., the fabrication and/or appropriate characterization of thin films, or materials that feature structures on the micrometer or sub-micrometer level. As such, its potential users encompass experimental researcher in essentially a wide variety of fields in natural science and medicine.
The manager of NanoLab (Dr. Roushdey Salh) was recruited from Germany, and is formally hired at the Department of Physics.
The equipment in NanoLab is made available to all scientists at Umeå University, as well as external institutions, for a fee of 300 SEK per hour. It is possible for high-volume users to apply for a discount. The NanoLab manager offers training sessions on each piece of equipment on an annual basis or on demand, and after approval following the training the user can independently use the equipment he or she has been trained on. Non-approved users can only use a piece of equipment under the supervision of the manager. Manuals and handbooks have been developed for each piece of equipment, and are available online or beside the equipment.
All of the equipment in NanoLab is available for booking during normal work days, and the booking system is available at:
Training and special courses concerning the equipment are offered annually often in November or December (exact date announced under KBC research courses), but also possible on demand.
NanoLab is used for both undergraduate education (grundutbildning) and graduate teaching. Two advanced courses on the undergraduate level (Nano Science 7.5hp and Advanced Materials 7.5hp) currently use NanoLab as their laboratory facility in which the experiments are carried out. Two courses on the graduate level (Cleanroom technology 1.5 ECTS and Physical thin film deposition 1.5 ECTS) are also offered annually and are announced at the KBC website. These courses have primarily attracted participants from the Physics, Chemistry and Applied Physics department, but participants from the international business program and the department of Clinical Microbiology have also attended. Specific teaching and training sessions have also been offered on a regular basis to interested users. The courses are given in English, and the numbers of students are between 17 and 25 in each undergraduate course, and between 5 and 10 in each graduate course. For the coming years, courses are planned in Nano-imprinting and Material surface modification.
is used for varieties of surface treatment, such as: cleaning, surface activation, etching. Samples can be up to 20 cm in diameter, two inlet gases are available.
is used for UV photo lithography using 350 W mercury lamp and Suss diffraction-reducing exposure optics. The primary exposure wavelengths of 365 or 403 nm lead to about 5 μm minimum resolution.
is used for producing metallic or organic thin layers between 1-400 nm at high vacuum pressure 5x10-8 Torr. The system has 3 normal deposition sources and 1 low temperature organic deposition source. Samples can be up to 30 cm in diameter, substrate rotation and heating up to 350°C and two gas inlets are available.
is used to stamp a pattern into a polymer coating on a substrate at max heating 250ºC and max pressure 70 bar. A stamp made of nickel or silicon. The substrate is heated and the stamp is pressed into the polymer. The resolution is up to 1 nm depending on the stamp.
provides high contrast, high magnification, optimal color fidelity, Imaging in different modes and with different magnifications.
X-ray source : Cu Kα, λ=1.5418 Å.
Operating range : 10 - 70 o2θ,
small-angle X-ray scattering possible too.
Temperature : Room temperature, but temperature
chamber available for lower and higher temperatures.
Humidity : Ambient, but humidity chamber available
for different humidities.
Sample amount : App. 10 mg
is used for producing thin layers from dissolved materials (liquids) at room temperature. Layer thicknesses (nm-μm range) controlled by the rotation speed between 1-10000 rpm.
is used for highly accurate measurements of static and dynamic contact angle, measure surface free energy, surface and interfacial tension.
Download: Facilities and Manuals (.zip file, 45.6 MB)