NanoLab is an open-access infrastructure, providing facilities in nano materials characterization located at the Department of Physics.
We are an open-access infrastructure located at the Department of Physics, which means anyone can use our equipment after having an adequate training. NanoLab provides the possibility to:
Produce thin layers (1 nm-500 nm) of metals or polymers on almost any kind of substrates.
Structuring material surfaces by lithography or nano-imprinting.
Modify and study material surface properties by plasma treatments and optical tensiometer.
Investigate materials structure by X-ray analysis.
Besides, NanoLab is a classified Class 100 cleanroom that can be used for your own experiments.
NanoLab infrastructure description
The Nanolab was established in June 2012, and has since its inception been in continuous development. Today, it comprises a variety of advanced fabrication and characterization setups, including a mask aligner (Karl Süss Mask Aligner MJB3), a nanoimprinter (Obducat NIL 2.5), a thin-film deposition system (PVD75 thermal evaporator), X-ray diffractometer (PANalytical Xpert3 Powder), a contact angle meter, and a spin coater, as well as number of more standard pieces of equipment, such as vacuum ovens, hotplates, optical microscopes, UV-curing boxes, and analytical scales. A short overview on the available equipment are to be found in below:
As NanoLab's environment is extremely clean (10 000 times less airborne particles than in a normal laboratory), it is possible to manufacture and study materials with notably high standard and precision. The facility is currently an invaluable tool for the University´s rapidly expanding research in the fields of microelectronics, optics and photonics, and nanotechnology, but it is also of obvious interest for scientists that are interested in, e.g., the fabrication and/or appropriate characterization of thin films, or materials that feature structures on the micrometer or sub-micrometer level. As such, its potential users encompass experimental researcher in essentially a wide variety of fields in natural science and medicine.
Organization and steering
The manager of NanoLab (Dr. Roushdey Salh) was recruited from Germany, and is formally hired at the Department of Physics.
The steering board
Ludvig Edman, Professor, Department of Physics
Thomas Wågberg, Professor, Department of Physics
Magnus Andersson, Associate professor, Department of Physics
Linda Sandblad, PhD, Department of Molecular biology
Christoffer Boman, Associate professor, Department of Applied Physics and Electronics
Service, availability and booking
The equipment in NanoLab is made available to all scientists at Umeå University, as well as external institutions, for a fee of 300 SEK per hour. It is possible for high-volume users to apply for a discount. The NanoLab manager offers training sessions on each piece of equipment on an annual basis or on demand, and after approval following the training the user can independently use the equipment he or she has been trained on. Non-approved users can only use a piece of equipment under the supervision of the manager. Manuals and handbooks have been developed for each piece of equipment, and are available online or beside the equipment.
All of the equipment in NanoLab is available for booking during normal work days, and the booking system is available at:
NanoLab is used for both undergraduate education (grundutbildning) and graduate teaching. Two advanced courses on the undergraduate level (Nano Science 7.5hp and Advanced Materials 7.5hp) currently use NanoLab as their laboratory facility in which the experiments are carried out. Two courses on the graduate level (Cleanroom technology 1.5 ECTS and Physical thin film deposition 1.5 ECTS) are also offered annually and are announced at the KBC website. These courses have primarily attracted participants from the Physics, Chemistry and Applied Physics department, but participants from the international business program and the department of Clinical Microbiology have also attended. Specific teaching and training sessions have also been offered on a regular basis to interested users. The courses are given in English, and the numbers of students are between 17 and 25 in each undergraduate course, and between 5 and 10 in each graduate course. For the coming years, courses are planned in Nano-imprinting and Material surface modification.
Equipment description and manuals
Atomic force microscope (Park NX-Hivac)
Park NX-Hivac enables material research that requires high accuracy and high resolution measurements in a vacuum environment. High vacuum measurement offers greater accuracy, better repeatability, and less tip and sample damage than ambient or dry N2 conditions.
Vacuum chamber: 300 mm x 420 mm x 320 mm Vacuum level: E10-5 torr XYZ scanner: X-Y 100 μm x 100 μm and Z 15 μm Optics: 10× Objective lens, 5M pixel CCD Single sample size: 50 mm x 50 mm, Multiple sample size: 10 mm x 10 mm, 4 pieces Sample thickness: up to 20 mm
Surface imaging and topography
True Non-Contact mode, Contact mode, Tapping mode including phase imaging.
2. Nanomechanical properties
PinPoint™ Nanomechanical mode, Force Distance Spectroscopy, Force Volume imaging, Force Modulation Microscopy, Lateral Force Microscopy, Nanoindentation, Spring constant Calibration.
3. Electrical properties
Electrostatic Force Microscopy, Kelvin Probe Force Microscopy, Dynamic Contact EFM, Piezoelectric Force Microscopy, Piezoelectric Response Spectroscopy. Besides Conductive Probe AFM and PinPoint Conductive AFM.
Achieved mechanically deforming the sample surface (scratch the sample surface with hard tips), or by changing of the surface's chemical properties (apply a bias between the tip and the surface). Objects can be drawn (bitmap images) in the software and printed onto the sample surface.
Atto Deiner Plasma Cleaner
is used for varieties of surface treatment, such as: cleaning, surface activation, etching. Samples can be up to 20 cm in diameter, two inlet gases are available (usually argon and oxygen).
is used for producing metallic or organic thin layers between 1-400 nm at high vacuum pressure 5x10-8 Torr. The system has 3 normal deposition sources and 1 low temperature organic deposition source. Samples can be up to 30 cm in diameter, substrate rotation and heating up to 350°C and two gas inlets are available.
is used to stamp a pattern into a polymer coating on a substrate at max heating 250ºC and max pressure 70 bar. A stamp made of nickel or silicon. The substrate is heated and the stamp is pressed into the polymer. The resolution is up to 1 nm depending on the stamp.
X-ray source : Cu Kα, λ=1.5418 Å. Operating range : 10 - 70 o2θ, small-angle X-ray scattering possible too. Temperature : Room temperature, but temperature chamber available for lower and higher temperatures. Humidity : Ambient, but humidity chamber available for different humidities. Sample amount : App. 10 mg
It is used to characterize thin layers electrical property of conducting and semiconducting materials. It is capable of delivering currents between 10 nA and 150 mA, and can measure voltages from as low as 100 μV up to 10 V. The system can measure sheet resistances in the range of 100 mΩ/square to 10 MΩ/square, enabling the characterization of a wide range of materials. If the sample thickness was provided, then the average resistivity and conductivity will also be displayed.