Advanced nanofabrication by EBL (Electron Beam Lithography) and IBL (Ion Beam Lithography)
Image Nils Valentin Hauff/UCEMUCEM provides Electron Beam Lithography (EBL) and Ion Beam Lithography (IBL) services utilising FEI Scios FIB-SEM. The system is equipped with the ELPHY Plus lithography kit, featuring a 20-bit DAC, 500 μm write fields, 1 pA to 400 nA writing current, 20 MHz patterning, and 1 ns dwell time increment—enabling high-precision nanofabrication.
Archimedean spiral for ultrafast pump-probe spectroscopy, fabricated via electron-beam lithography (EBL) using a gold lift-off process with a bilayer PMMA resist.
Image Nils Valentin Hauff/UCEMResearch projects applying EBL profit from the combined expertise and resources at UCEM and the Nanolab at the Department of Physics. Facilities and staff collaborate to support cutting-edge technology developments.
For more information, please contact: Nils Valentin Hauff (nils.hauff@umu.se)